Information about http://www.eeel.nist.gov/omp/Portfolio%20files%20for%202007/Program%20Sections/Analysis%20Tools%20Section.pdf

ANALYSIS TOOLS AND TECHNIQUES PROGRAM The…

Tags: 1 billion, analysis tools, analytical techniques, analytical tools, device dimensions, device fabrication, latter condition, manufacturing process, measurement techniques, measurements, nanoelectronics, nanometer level, new materials, nm size, particles, sacrifices, semiconductor microelectronics, significant improvements, stress measurement, transistors,
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Language: english
Created: Thu Jul 5 13:49:50 2007

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ANALYSIS TOOLS                     AND      TECHNIQUES PROGRAM
The continuing shrinking of device dimensions and the rapid inclusion of new materials into
device fabrication demands the development of new analytical tools and techniques. The
need for new analytical techniques and tools has increased as the components in the transis-
tors approach the low nanometer level and the number of transistors per chip approaches
1 billion. The development of tools capable of characterizing the structures produced in the
laboratories as well as those needed to confirm the manufacturing process require significant
improvements. Those used for production also require significant speeds not to slow down
the commercial manufacturing. This latter condition may require some sacrifices in the
resolution and accuracy of those tools. In addition, more significant modeling that allows us
to bridge those areas where measurements can be done to those where knowledge is needed,
but measurements cannot be done is critical. Significant improvements in tools capable of
analyzing properties of defect particles in the sub-30 nm size are urgently needed. Global
and local stress measurement techniques need to be developed.




Semiconductor Microelectronics and Nanoelectronics Programs                            147